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Online monitor the gas control parameter is very important for film deposition and quality in RMS (Reactive Magnetron Sputtering) process. According to the RMS monitoring requirement, the reactive gas control method was analyzed, the gas flow controller based on PEM (Plasma Emission Monitoring) method and reactive parameters monitoring plan were proposed. The functions of monitoring system were analyzed, a private serial communication protocol for parameter transmitting between controller and PC was proposed, on this basis, monitoring system was designed with LabVIEW through serial communication; the functions were taken experiment in the RMS machine with self-made gas controller. The result indicated that the controller based on PEM could control the gas flow according to the requirement of film process and the monitoring functions were correct, which could provide parameter adjustment for gas controller and light intensity. The monitoring system provides a valid method to improve the film quality.